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Please use this identifier to cite or link to this item: http://hdl.handle.net/2289/2307

Title: Investigations on the influence of process parameters on the structural evolution of ion beam sputter deposited chromium thin films
Authors: Balu, R.
Raju, A.R.
Lakshminarayanan, V.
Mohan, S.
Keywords: Chromium thin films
Ion Beam Sputter Deposition (IBSD)
Oblique deposition
Issue Date: 15-Nov-2005
Publisher: Elsevier B.V.
Citation: Materials Science and Engineering B, 2005, Vol.123, p7-12
Abstract: Chromium thin films are technologically important as underlayers for the deposition of cobalt-based magnetic films because of their good lattice match and adhesion. The structural orientation and morphology of the chromium under layers control the magnetic properties of the cobalt-based films deposited on them. Hence, optimization of the structure and properties of chromium under layers is essential for realizing magnetic thin films with desired properties. In this paper, we report the structural variation observed in chromium thin films deposited on silicon(1 0 0) substrates deposited using Ion Beam Sputter Deposition (IBSD) technique. The influence of process parameters, such as ion beam current density, substrate temperature and the angle of incidence of the condensing species, on the structural transformation from (1 1 0) orientation to (2 0 0) orientation has been presented. The structural variation and morphological variations observed have been discussed based on the growth models and the energetics involved in the process.
Description: Restricted Access.
URI: http://hdl.handle.net/2289/2307
ISSN: 0921-5107
Alternative Location: http://dx.doi.org/10.1016/j.mseb.2005.06.021
Copyright: 2005 Elsevier B.V.
Appears in Collections:Research Papers (SCM)

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