1. RRI Digital Repository
  2. 06. Soft Condensed Matter
  3. Research Papers (SCM)
Please use this identifier to cite or link to this item: http://hdl.handle.net/2289/2307
Full metadata record
DC FieldValueLanguage
dc.contributor.authorBalu, R.-
dc.contributor.authorRaju, A.R.-
dc.contributor.authorLakshminarayanan, V.-
dc.contributor.authorMohan, S.-
dc.date.accessioned2007-04-27T05:55:24Z-
dc.date.available2007-04-27T05:55:24Z-
dc.date.issued2005-11-15-
dc.identifier.citationMaterials Science and Engineering B, 2005, Vol.123, p7-12en
dc.identifier.issn0921-5107-
dc.identifier.urihttp://hdl.handle.net/2289/2307-
dc.descriptionRestricted Access.en
dc.description.abstractChromium thin films are technologically important as underlayers for the deposition of cobalt-based magnetic films because of their good lattice match and adhesion. The structural orientation and morphology of the chromium under layers control the magnetic properties of the cobalt-based films deposited on them. Hence, optimization of the structure and properties of chromium under layers is essential for realizing magnetic thin films with desired properties. In this paper, we report the structural variation observed in chromium thin films deposited on silicon(1 0 0) substrates deposited using Ion Beam Sputter Deposition (IBSD) technique. The influence of process parameters, such as ion beam current density, substrate temperature and the angle of incidence of the condensing species, on the structural transformation from (1 1 0) orientation to (2 0 0) orientation has been presented. The structural variation and morphological variations observed have been discussed based on the growth models and the energetics involved in the process.en
dc.format.extent373585 bytes-
dc.format.mimetypeapplication/pdf-
dc.language.isoenen
dc.publisherElsevier B.V.en
dc.relation.urihttp://dx.doi.org/10.1016/j.mseb.2005.06.021en
dc.rights2005 Elsevier B.V.en
dc.subjectChromium thin filmsen
dc.subjectIon Beam Sputter Deposition (IBSD)en
dc.subjectOblique depositionen
dc.titleInvestigations on the influence of process parameters on the structural evolution of ion beam sputter deposited chromium thin filmsen
dc.typeArticleen
Appears in Collections:Research Papers (SCM)

Files in This Item:
File Description SizeFormat 
2005 MSE-B V123 p7-12.pdf
  Restricted Access		Restricted Access364.83 kBAdobe PDFView/Open Request a copy
Show simple item record


Items in RRI Digital Repository are protected by copyright, with all rights reserved, unless otherwise indicated.